Our lab disposes of two highly sensitive MO spectrometers allowing the MO investigations in the photon energy range from 0.5 to 6 eV. Both spectrometer setups are based on rotating analyzer method with the precision of well below 1 mDeg and spectral resolution of 1-3 nm. Presence of various types of electromagnets allows MO experiments in transmission and reflection geometries in magnetic fields up to 1.2 T. Temperature dependent measurements are available from 4 to 800 K in three setups. We have at disposal one Montana Cryostation from Montana Instruments, capable of Faraday and Kerr measurements in the temperature range 4-340 K and applied field up to 940 mT. Other cryostat is capable of reaching up to 800 K with applied field of 200mT. Third setup is a superconducting 3D vectorial magnet with cryostat, capable of providing up to 1 T magnetic field in any direction.
Our lab has a spectroscopic ellipsometer Woollam RC2 with the ability of full Mueller matrix measurements in the spectral energy range from 0.7 to 6 eV. Temperature dependent measurements in ellipsometry are also possible with temperature control using a stage with Peltier element of by using the high temperature cryostat. Ellipsometry is capable of determining optical constants, absorption coefficient and together with the MO measurement also the dielectric permittivity tensor. It is a complementary characterisation technique to our thin film sputtering for determining the thickness of the films.
Thin film sputtering is done in a magnetron sputtering system provided by the company Bestec. We have nine targets at our disposal with 5 individual power sources. Argon of Oxide gas Ion gun is included for ion milling. Up to three separate targets can be used for co-sputtering of thin films. Quartz oscillator determines the sputter rate and up to three gases can be used for the film growth. The setup is equipped with a load-lock and we are able to sputter samples with dimensions from 4×4 mm^2 to 4 inch diameter substrates.